MORE MOORE - Exploring new limits to Moore's law (FP6-IST) (2004-01-01 - 2006-12-31) (»add to infobox)

Robert Arnold HARTMAN, Peter KUERZ, Kurt RONSE, Serge TEDESCO, Ton G. T. M. BASTEIN, Jan Hendrik PETERS, Joseph PANKERT, Guido SCHRIEVER, Claude MONTCALM, Ulf KLEINEBERG, Christian ZIETHEN, Matthias ESCHER, Joseph J. J. M. BRAAT, Xavier BOZEC, Xavier LEVECQ, Andreas ERDMANN, Patrick SCHIAVONE, Thomas SCHMOELLER, Konstantin KOSHELEV, Francesco FLORA, Evangelos GOGOLIDES, Michele BERTOLO, Leonid SJMAENOK, Peter CHOI, Fred BIJKERK, N. N., N. N., N. N., N. N., N. N., N. N., N. N., N. N., N. N.

ASML NETHERLANDS B.V. (NL414 - Zuidoost-Noord-Brabant) (Netherlands), CARL ZEISS SMT AG (DE11D - Ostalbkreis) (Germany), INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW (BE242 - Arr. Leuven) (Belgium), COMMISSARIAT A L'ENERGIE ATOMIQUE (CEA) (FR101 - Paris) (France), THE NETHERLANDS ORGANISATION OF APPLIED SCIENTIFIC RESEARCH (NL333 - Delft en Westland) (Netherlands), ADVANCED MASK TECHNOLOGY CENTER GMBH & CO. KG (DED21 - Dresden, Kreisfreie Stadt) (Germany), PHILIPS EXTREME UV GMBH (DE600 - Hamburg) (Germany), XTREME TECHNOLOGIES GMBH (DEG03 - Jena, Kreisfreie Stadt) (Germany), XENOCS S.A. (FR714 - Isère) (France), UNIVERSITAET BIELEFELD (DEA41 - Bielefeld, Kreisfreie Stadt) (Germany), JOHANNES GUTENBERG UNIVERSITY MAINZ (DEB35 - Mainz, Kreisfreie Stadt) (Germany), FOCUS GMBH GERAETE ZUR ELEKTRONENSPEKTROSKOPIE UND OBERFLAECHENANALYTIK (DE71 - Darmstadt) (Germany), DELFT UNIVERSITY OF TECHNOLOGY (NL333 - Delft en Westland) (Netherlands), SAGEM S.A. (FR101 - Paris) (France), IMAGINE OPTIC (FR104 - Essonne) (France), FRAUNHOFER GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE212 - München, Kreisfreie Stadt) (Germany), CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) (FR101 - Paris) (France), SIGMA-C SOFTWARE AG (DE212 - München, Kreisfreie Stadt) (Germany), INSTITUTE OF SPECTROSCOPY OF RUSSIAN ACADEMY OF SCIENCE (RU - Russia) (Russia), ITALIAN NATIONAL AGENCY FOR NEW TECHNOLOGIES, ENERGY AND THE ENVIROMENT (ITE43 - Roma) (Italy), NATIONAL CENTRE FOR SCIENTIFIC RESEARCH "DEMOKRITOS" (GR300 - Attiki) (Greece), SINCROTRONE TRIESTE SCPA (ITD43 - Gorizia) (Italy), PHYSTEX (NL423 - Zuid-Limburg) (Netherlands), EPPRA SAS (FR104 - Essonne) (France), FOUNDATION FOR FUNDAMENTAL RESEARCH ON MATTER (NL310 - Utrecht) (Netherlands), PHILIPS TECHNOLOGIE GMBH FORSCHUNGSLABORATORIEN AACHEN (DEA21 - Aachen, Kreisfreie Stadt) (Germany), CARL ZEISS LASER OPTICS GMBH (DE11D - Ostalbkreis) (Germany), SCHOTT LITHOTEC AG (DEG03 - Jena, Kreisfreie Stadt) (Germany), MEDIA LARIO S.R.L. (ITC42 - Como) (Italy), AZ ELECTRONIC MATERIALS (GERMANY) GMBH (DE714 - Wiesbaden, Kreisfreie Stadt) (Germany), PHILIPS GMBH (DE600 - Hamburg) (Germany), SAGEM DEFENSE SECURITE (FR101 - Paris) (France), INSTITUTE FOR PHYSICS OF MICROSTRUCTURES OF RUSSIAN ACADEMY OF SCIENCES (RU - Russia) (Russia), THE UNIVERSITY OF BIRMINGHAM (UKG31 - Birmingham) (Great Britain)

This research proposal is about Extreme Ultra Violet Lithography (EUVL), the next generation technologychosen by the electronics industry to manufacture integrated circuits in 2010 and beyond. It represents anopportunity to boost the intensive efforts made by industry to reach new standards in lithography and achieveEuropean leadership in the highly competitive sector of electronics manufacturing technology and know-how.The Integrated Project more Moore will involve various large and small manufacturing companies and researchinstitutes or universities, all highly specialised in the key domains of EUVL and at the vanguard of Europeanlithography research and development. Under the co-ordination of a leading European manufacturer of chipmaking equipment, the consortium constitutes a unique platform to integrate expertise in key branches oflithography, and to produce breakthrough technological solutions.The project will develop, ahead of the ITRS international roadmap (described in the main report), semiconductordevices shrunk by an order of magnitude down to the 5-nm size.The essential elements of the "More Moore" integrated research project can be summarised as follows: More Moore will build upon and complement the work done in EUVL under National and EUREKAprogrammes, especially MEDEA+; The research will push the limits of lithography to enable and exceed the requirements for the 22 nm node; As an Integrated Project, it will extend the RandD network in this domain by including all capable institutes,universities and SME's.

PERSONS (34/34)

RELATED NAVIGATION AREA(S) (1/1)